Product Description

 Silicon dioxide (SiO2) sputtering targets

Purity 99.995%

Shape: Discs, disks, step disk, delta, plate, sheets or made per drawing

Diameter: 355.6mm (14") max.

Single piece Size: Length: <500mm, Width: <250mm, Thickness: >1mm, if larger size than this, we can do it as Tiles joint by 45 degree or 90 degree

Made sputtering targets method: hot pressing (HP), hot/cold isostatic pressing (HIP, CIP), and vacuum melting, vacuum sintering

 To make glass ceramics, abrasion agent, oil bleaching and purification ferrosilicon, determination boron, arsenic and silver, etc. Thin layer chromatography analysis with the board.

specification︰ Purity 99.995%
Shape: Discs, disks, step disk, delta, plate, sheets or made per drawing
Diameter: 355.6mm (14") max.
Single piece Size: Length: <500mm, Width: <250mm, Thickness: >1mm, if larger size than this, we can do it as Tiles joint by 45 degree or 90 degree

Label︰ Silicon dioxide (SiO2) targets use in thin film coating

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