Boride Sputtering Targets

 

 

 

Shape: discs, plate, rod, tube, sheet, Delta, and per drawing

 

Spec.:

Diameter: 355.6mm (14") max.

Single piece Size: Length: <500mm, Width: <250mm, Thickness: >1mm,

if larger size than this, we can do it as tiles joint by 45 degree or 90 degree.

Made sputtering targets method: hot pressing (HP), hot/cold isostatic pressing (HIP, CIP), and vacuum melting, vacuum sintering

 

Material Name

Formula

purity

Chromium Boride

CrB2

 99.5%

Copper Boride

CuB2

 99.5%

Titanium Boride

TiB2

 99.5%

Tantalum Boride

TaB2

 99.5%

Tungsten Boride

W2B5, WB

 99.5%

Vanadium Boride

V2B

 99.5%

Zirconium Boride

ZrB2

 99.5%

 

We have only listed the more popular material. Please feel free contact us with any special requirements at any times, we will try to get back for you ASAP.

 

 

 

 

 

offering sputtering targets, evaporation material, rare earth metal, rare earth oxide, chemistry reagent

 

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