Aluminium fluoride AlF3 sputtering targets CAS 7784-18-1

Aluminum Fluoride (AlF3) ceramic sputtering target

Purity: 99.9%

Shape: Discs, disks, step disk, delta, plate, sheets or made per drawing

Diameter: 355.6mm (14") max.

Single piece Size: Length:<500mm, Width: <250mm, thickness:="">1mm, if larger size than this, we can do it as Tiles joint by 45 degree or 90 degree

Made sputtering targets method: hot pressing (HP), hot/cold isostatic pressing (HIP, CIP), and vacuum melting, vacuum sintering

Aluminum fluoride (AlF3) is an inorganic compound used primarily in the production of aluminum. This

 colorless solid can be prepared synthetically but also occurs in nature.

 Molar mass 83.9767 g/mol (anhydrous), 101.022 g/mol (monohydrate), 138.023 (trihydrate), 

Appearance:  white, crystalline solid, odorless , 

Density 3.1 g/cm3 (anhydrous), 2.1 g/cm3 (monohydrate), 1.914 g/cm3 (trihydrate) , 

Melting point 1291 °C (anhydrous)(sublimes) , 

Solubility in water 0.56 g/100 mL (0 °C), 0.67 g/100 mL (20 °C), 1.72 g/100 mL (100 °C) 

Applications: 

Aluminum fluoride is an important additive for the production of aluminum by electrolysis. Together with

 cryolite, it lowers the melting point to below 1000 °C and increases the conductivity of the solution. It is

 into this molten salt that aluminum oxide is dissolved and then electrolyzed to give bulk Al metal

 Aluminum fluoride is an ingredient for the production of fluoro aluminate glasses.

It is also used to inhibit fermentation.

It is a sputtering target for preparation of low index films.